Chemical Mechanical Planarization Slurry Market Size, Share, Opportunities, And Trends By Type (Aluminum Oxide, Ceramic, Cerium Oxide, Silica, Others), By Application (Silicon Wafers, Optical Substrates, Disk-Drive Components, Others), And By Geography - Forecasts From 2023 To 2028

The chemical mechanical planarization slurry market is projected to grow at a high during the forecast period

The market's growth is boosted by the expanding technological developments in fabrication and semiconductor processes, which are primarily intended to improve the semiconductor's performance. The factor driving market expansion is rising investment in semiconductor wafer manufacturing materials for new product development by the manufacturers. Moreover, a rising need for semiconductors and memory chips in industries including the Internet of Things (IoT), automotive, and 5G. The market for CMP slurry is also expected to be driven by the rising popularity of electric and driverless vehicles, which has a significant impact on the need for semiconductors and ICs.

Increase in adoption of planarization in the semiconductor industry

In the semiconductor sector, chemical mechanical planarization slurry is frequently used for metal layer planarization and oxide dielectric planarization. It is also used to create MEMS or microelectromechanical systems. The semiconductor business is being driven by an increased demand for mobile devices, PCs, and moulded interconnect devices (MIDs). Consequently, growth in the semiconductor sector is anticipated to fuel the chemical mechanical planarization slurry market during the time of forecasting.

Increased demand in the consumer electronics sector

The consumer electronics industry is expanding as a result of the increased use of 3D devices, LEDs, smartphones, laptops, TVs, and gaming consoles. A vital component of practically every consumer electrical appliance is a printed circuit board (PCB). Significant investment has also been made in PCB fabrication as a result of the increase in telematics, Advanced Driver Assistance Systems (ADAS), and infotainment device integration in automobiles. Due to the rising demand for comfort, security, and safety in automotive, ADAS is gaining ground in the automotive industry. Therefore, the need for chemical mechanical planarization is increasing due to the growth of the electronics industry and the increased integration of electronic control units in automotives.

Increasing use of chemical mechanical planarization slurry in integrated circuits

In order to obtain the necessary planarity of the substrate and the deposited layers, chemical mechanical planarization slurry is widely used in integrated circuits. The creation of new manufacturing facilities, improvements in electronics and assembly technology, and other factors are the main factors influencing integrated circuit production. For instance, according the data from the Japan Electronics and Information Technology Industries Association (JEITA) The worldwide electronics and information technology sectors are expected to produce $2,972.7 billion in 2020 and $3,175.6 billion in 2021, respectively, As a result, there is a growing need for chemical mechanical planarization slurry to level off uneven surfaces due to the increase in integrated circuit production.

Increasing developments in solar energy projects

The use of chemical mechanical planarization slurry in rotary buffing equipment to remove minute amounts of surface substance from crystalline workpieces makes it the perfect material for solar panels. One significant factor driving the development of new solar projects is the shift in emphasis toward the generation of power from renewable energy. For instance, the investment of USD 1,000 million 1,00 MW Smoky Valley Solar Project in the United States, and a USD 100 million 119 MW solar park in Saudi Arabia are examples of solar energy projects that are under construction. As a result, the demand for photovoltaic panels will increase the chemical mechanical planarization slurry market share.

Rising application of chemical mechanical planarization slurry for silicon wafers

Chemical mechanical planarization is the most widely used process for reducing surface imperfections in silicon wafers. Abrasives of the nanometer scale are often distributed in an acidic or basic solution to form CMP slurries. During mechanical abrasion, a chemical reaction causes the substance to soften. Critical parameters, such as the rate of removal and wafer flaws, are significantly impacted by the size distribution of the abrasive particles which increases the chemical mechanical planarization slurry market share for silicon wafers

Asia Pacific is projected to dominate the Chemical mechanical planarization slurry market

During the projected period, the Asia Pacific region is anticipated to lead the chemical mechanical planarization slurry market. This can be attributable to the region's expanding semiconductor sector. Chemical mechanical polishing is said to be the most important process in semiconductor fabrication. While one of the primary uses of CMP is material removal, it is also increasingly being utilized for a variety of other purposes, such as defect reduction, uniformity control, and semiconductor surface smoothening. These developments are anticipated to boost the expansion of the chemical mechanical planarization slurry market in Asia Pacific.

Market key launches

• In March 2023, Saint-Gobain Surface Conditioning lowers its carbon footprint by starting a new ClasSiCTM production line in Avignon, France. ClasSiCTM alumina polishing slurries are high-precision slurries created especially for silicon carbide wafers used in the production of LED and power electrical devices during chemical mechanical planarization (CMP). ClasSiCTM CMP slurries significantly improve removal rate and planarization performance, providing SiC wafers with a superb surface finish. Monocrystalline Silicon Carbide, also known as SiC, is a developing and expanding substrate material that enables semiconductor chips to operate at higher powers, temperatures, and processes with greater efficiency.
• In September 2022, the decision to increase manufacturing capacity and evaluation capabilities for "CMP slurries, polishing materials used in the procedure of semiconductor integrated circuits production" was announced by Showa Denko Materials Co., Ltd. To fulfil the rising demand for CMP slurry and to promote the development of materials for sophisticated needs of cutting-edge electronics, an expenditure of about 20 billion yen is made. The capacity of CMP slurry manufacturing at Showa Denko Materials Group is anticipated to rise by around 20% as a result of this development.
• In December 2021, Entegris agreed to acquire CMC Materials in a deal for roughly $6.5 billion as part of the ongoing consolidation in the electronic materials market. The top manufacturer of chemical mechanical planarization (CMP) slurries, which are used to level the surfaces of silicon wafers with embedded circuitry in between stages of semiconductor chip creation, is CMC, formerly known as Cabot Microelectronics until last year. It generates revenues of roughly $1.2 billion yearly. The equipment and chemicals sold by Entegris for use in chip manufacturing have an annual sales volume of around $2.1 billion. The merger will produce "the industry's most comprehensive and innovative end-to-end electronic materials offering," Entegris CEO Bertrand Loy said in announcing the agreement.

Segmentation:

• By Type
  • Aluminum Oxide
  • Ceramic
  • Cerium Oxide
  • Silica
  • Others
• By Application
  • Silicon Wafers
  • Optical Substrates
  • Disk-Drive Components
  • Others
• By Geography
  • North America
    • United States
    • Canada
    • Mexico
  • South America
    • Brazil
    • Argentina
    • Others
  • Europe
    • United Kingdom
    • Germany
    • France
    • Spain
    • Others
  • Middle East and Africa
    • Saudi Arabia
    • UAE
    • Israel
    • Others
  • Asia Pacific
    • China
    • Japan
    • India
    • South Korea
    • Indonesia
    • Thailand
    • Others

1.  INTRODUCTION

1.1. Market Overview

1.2. Market Definition

1.3. Scope of the Study

1.4. Market Segmentation

1.5. Currency

1.6. Assumptions

1.7. Base, and Forecast Years Timeline

2. RESEARCH METHODOLOGY  

2.1. Research Data

2.2. Assumptions

3. EXECUTIVE SUMMARY

3.1. Research Highlights

4. MARKET DYNAMICS

4.1. Market Drivers

4.2. Market Restraints

4.3. Porter’s Five Force Analysis

4.3.1. Bargaining Power of Suppliers

4.3.2. Bargaining Power of Buyers

4.3.3. Threat of New Entrants

4.3.4. Threat of Substitutes

4.3.5. Competitive Rivalry in the Industry

4.4. Industry Value Chain Analysis

5. CHEMICAL MECHANICAL PLANARIZATION SLURRY MARKET, BY TYPE

5.1. Introduction

5.2. Aluminum Oxide

5.3. Ceramic

5.4. Cerium Oxide

5.5. Silica

5.6. Others

6. CHEMICAL MECHANICAL PLANARIZATION SLURRY MARKET, BY APPLICATION

6.1. Introduction

6.2. Silicon Wafers

6.3. Optical Substrates

6.4. Disk-Drive Components

6.5. Others

7. CHEMICAL MECHANICAL PLANARIZATION SLURRY MARKET, BY GEOGRAPHY

7.1. Introduction 

7.2. North America

7.2.1. USA

7.2.2. Canada

7.2.3. Mexico

7.3. South America

7.3.1. Brazil

7.3.2. Argentina

7.3.3. Others

7.4. Europe

7.4.1. Germany

7.4.2. France

7.4.3. United Kingdom

7.4.4. Spain

7.4.5. Others

7.5. Middle East And Africa

7.5.1. Saudi Arabia

7.5.2. UAE

7.5.3. Israel

7.5.4. Others

7.6. Asia Pacific

7.6.1. China

7.6.2. Japan

7.6.3. India

7.6.4. South Korea

7.6.5. Indonesia

7.6.6. Taiwan

7.6.7. Others

8. COMPETITIVE ENVIRONMENT AND ANALYSIS

8.1. Major Players and Strategy Analysis

8.2. Emerging Players and Market Lucrativeness

8.3. Mergers, Acquisitions, Agreements, and Collaborations

8.4. Vendor Competitiveness Matrix

9. COMPANY PROFILES

9.1. Cabot Microelectronics Corporation

9.2. Showa Denko Materials Co. Ltd

9.3. Hitachi Chemical Co. Ltd

9.4. Fujifilm Corporation

9.5. Fujimi Corporation

9.6. DuPont

9.7. Merck KGaA 

9.8. Saint-Gobain Ceramics & Plastics Inc.

9.9. BASF 

Cabot Microelectronics Corporation

Showa Denko Materials Co. Ltd

Hitachi Chemical Co. Ltd

Fujifilm Corporation

Fujimi Corporation

DuPont

Merck KGaA

Saint-Gobain Ceramics & Plastics Inc.

BASF